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Comparative Analysis of Mobility and Dopant Number Fluctuations Models For The Threshold Voltage Fluctuations Estimation in 45 nm Channel Length MOSFET Device
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Modeling fluctuations in threshold voltage and on-current due to random telegraph noise
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Comparative analysis of mobility and dopant number fluctuations based models for the threshold voltage fluctuations estimation in 45 nm channel length MOSFET devices in the presence of random traps and random dopants
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3D Ensemble Monte Carlo device simulations of random trap induced degradation in drain current and in threshold voltage in the presence of random dopant distributions for 45 nm gate length MOSFETs
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Monte Carlo simulation of impact of random telegraph noise in 45 nm MOSFET due to coupled effects of random interface and oxide traps with random channel dopant distributions
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Comparative analysis of threshold voltage variations in presence of random channel dopants and a single random interface trap for 45 nm n-MOSFET as predicted by Ensemble Monte Carlo simulation and existing analytical model expressions
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Impact of Channel Length and Gate Width of a n-MOSFET Device on the Threshold Voltage and its Fluctuations in Presence of Random Channel Dopants and Random Interface Trap: A 3D Ensemble Monte Carlo Simulation Study
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Reliability Studies in 45 nm Technology Node Threshold Voltage Fluctuations due to Random Dopants and Random Telegraph Noise
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3D Ensemble Monte Carlo Device Simulations of Random Trap Induced Degradation in Drain Current and in Threshold Voltage in the Presence of Random Dopant Distributions for 45 nm Gate Length n-MOSFET
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