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Department of

Electrical & Computer Engineering

North South University

Department of Electrical and Computer Engineering

School of Engineering
& Physical Sciences
 
  • About Us
    • Message from the Chair
    • Mission Statement
    • Contact Us
  • Undergraduate
    • Admission
      • Prospective Students
      • Transfer Students
        • Internal Transfers
        • External Transfers
    • Academics
      • Programs
      • Advising
      • Policies
    • Directed Research (498R)
    • Financial Aid
    • Internship (498R)
  • Graduate
    • Admission
      • MSCSE
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      • MSETE
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      • Programs
      • Advising
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  • People
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  • Research
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    • Research Labs
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    • ACM Student Chapter
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  • Resources
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    • Laboratories
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    • Medical
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Home > Publications

  • October 15, 2015

    1/f Noise: Threshold Voltage and On-Current Fluctuations in 45 nm Device Technology Due To Charged Random Traps

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  • October 15, 2015

    Impact of RDF and RTS On the Peformance of SRAM Cells

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  • October 15, 2015

    Design and Fabrication of a Meso-Scale Variable Capacitance Motor For Miniature Heat Pumps

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  • October 15, 2015

    Atomistic Simulations on Reliability

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  • October 15, 2015

    Comparative Analysis of Mobility and Dopant Number Fluctuations Models For The Threshold Voltage Fluctuations Estimation in 45 nm Channel Length MOSFET Device

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  • October 15, 2015

    Modeling fluctuations in threshold voltage and on-current due to random telegraph noise

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  • October 15, 2015

    Comparative analysis of mobility and dopant number fluctuations based models for the threshold voltage fluctuations estimation in 45 nm channel length MOSFET devices in the presence of random traps and random dopants

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  • October 15, 2015

    3D Ensemble Monte Carlo device simulations of random trap induced degradation in drain current and in threshold voltage in the presence of random dopant distributions for 45 nm gate length MOSFETs

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  • October 15, 2015

    Monte Carlo simulation of impact of random telegraph noise in 45 nm MOSFET due to coupled effects of random interface and oxide traps with random channel dopant distributions

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  • October 15, 2015

    Comparative analysis of threshold voltage variations in presence of random channel dopants and a single random interface trap for 45 nm n-MOSFET as predicted by Ensemble Monte Carlo simulation and existing analytical model expressions

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North South University


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North South University
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